Semiconductor Cleaning SC-1
Standard Clean 1 solution for removing organic contamination and particles from silicon wafers. Ammonium hydroxide and hydrogen peroxide formulation meeting SEMI C8 and ITRS specifications. Available in various NH4OH concentrations.
Technical Information
| Purity / Grade | 🔒 Register free to view |
| Minimum Order Qty | 🔒 Register free to view |
| Category | Cleaning and Processing Chemicals |